Electric-field-sensitive element and display device using the same

ABSTRACT

An electric-field-sensitive element ( 1 ) includes: an optical function layer ( 5 ) that includes a metal oxide selected from the group consisting of tin dioxide, titanium dioxide and zinc oxide, and an insulating material covering the metal oxide, the optical function layer ( 5 ) having a visible light transmittance that changes through application of an electric field; and a first and second electrode layer ( 7, 9 ) that sandwich the optical function layer ( 5 ) therebetween.

CROSS REFERENCE TO RELATED APPLICATION

This application claims the benefit under 35 U.S.C. Section 371, of PCTInternational Application No. PCT/JP2006/322011, filed Nov. 2, 2006, thedisclosure of which is hereby incorporated by reference.

TECHNICAL FIELD

The present invention relates to an element having a visible lighttransmittance value that can be controlled through application of anelectric field, and a display device to which such an element isapplied.

BACKGROUND ART

Liquid crystals and electrochromic substances are known as materialsthat change their optical transmittance values in response to anelectric field applied thereto. Liquid crystals have already been widelyused in displays. Electrochromic substances are substances that exhibitchromism (reversible color change) through an electrochemicaloxidation-reduction reaction, and can be considered as finding variousapplications including in a paper-like display (so-called “electronicpaper”). Materials of this kind, which are sensitive to electric fields,are advantageous in that they can be more easily controlled thansubstances that are sensitive to light or heat, in terms of theconfiguration of their control means.

Although many electrochromic substances are high molecular weightcompounds that are chemically synthesized, JP 2000-502398W disclosesthat tin oxide doped with antimony or niobium exhibits electrochromism.This publication reports that a cyclic color change following anelectric signal of 50 mHz occurred (the response speed in this case is20 seconds). The above-mentioned publication also describes that mixinga light-colored pigment such as titanium dioxide, silica, or aluminawith doped tin oxide is effective in improving contrast.

-   Patent Document 1: JP 2000-502398W

DISCLOSURE OF THE INVENTION

In terms of application in displays, electrochromic substances aresuperior to liquid crystals in transparency in a translucent state andpower consumption, since they do not require a polarizing plate or abacklight. However, electrochromism involves ion migration through anelectrolyte, and, therefore, it is presumably difficult to increase theresponse speed of the sensitivity of an electrochromic substance to thesame level or higher than that in a liquid crystal. The response speedin a typical liquid crystal in a color change between white and black is10 to 20 ms.

The present invention provides a novel electric-field-sensitive elementthat contains a metal oxide and that undergoes rapid transition betweenstates with different visible light transmittance values. Anelectric-field-sensitive element according to the present inventionincludes an optical function layer that includes a metal oxide selectedfrom the group consisting of tin dioxide, titanium dioxide and zincoxide, and an insulating material covering the metal oxide, the opticalfunction layer having a visible light transmittance value that changesthrough application of an electric field; and a first electrode layerand a second electrode layer that sandwich the optical function layer.

A display device provided by the present invention includes a supporthaving a light surface color; a first translucent electrode layer fixedto the support; an optical function layer covering the first translucentelectrode layer; and a second translucent electrode layer laminated onthe optical function layer. The optical function layer includes a metaloxide selected from the group consisting of tin dioxide, titaniumdioxide and zinc oxide, and an insulating material covering the metaloxide, and has a visible light transmittance value that changes throughapplication of an electric field.

A production method provided by the present invention includes the stepsof: coating the first electrode layer fixed to a support with atranslucent layer made of the metal oxide and an insulating materialcovering said metal oxide; irradiating the translucent layer withultraviolet light, thereby altering the translucent layer to form theoptical function layer; and fixing the second electrode layer to theoptical function layer.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view showing the configuration of anelectric-field-sensitive element according to an example of the presentinvention.

FIG. 2 is a perspective view showing the configuration of a displaydevice according to an example of the present invention.

FIG. 3 shows photographs of oscilloscope waveforms showing theresponsiveness of an electric-field-sensitive element according to afirst example of the present invention.

FIG. 4 shows photographs of oscilloscope waveforms showing theresponsiveness of an electric-field-sensitive element according to asecond example of the present invention.

FIG. 5 illustrates the operation principles of anelectric-field-sensitive element according to an example of the presentinvention.

BEST MODE FOR CARRYING OUT THE INVENTION

The present inventor found that, when a translucent metal oxide that isa semiconductor having a band gap of 3.2 eV or more is given aneffective excitation energy in a state in which it is provided with aninsulating coating, the metal oxide turns into a substance having avisible light transmittance value that changes through application of anelectric field. Tin dioxide (SnO₂), titanium dioxide (TiO₂) and zincoxide (ZnO) correspond to the above-described metal oxide. Examples ofthe material for the insulating coating include thermoplastic resinssuch as polyethylene, polypropylene, polystyrene, polybutadiene,polyvinyl chloride, polymethyl methacrylate, polyamide, polycarbonate,polyimide and cellulose acetate, as well as thermosetting resins such asphenol resin, amino resin, unsaturated polyester resin, allyl resin,alkyd resin, epoxy resin, polyurethane and silicon resin. Other examplesinclude silicone (polysiloxane), paraffin, mineral oil, magnesium oxide(MgO), silicon dioxide (SiO₂) and alumina (Al₂O₃).

Sandwiching the above-mentioned substances between electrode layershaving different materials as shown in FIG. 1 can provide anelectric-field-sensitive element 1 having a visible light transmittancevalue that reversibly changes. In FIG. 1, the electric-field-sensitiveelement includes an optical function layer 5 having a visible lighttransmittance value that changes through application of an electricfield, a first electrode layer 7 and a second electrode layer 9. In theillustrated example, the first electrode layer 7 is made up of a singlelayer, whereas the second electrode layer 9 is made up of a lower layer9A having a material different from that of the first electrode layer 7and an upper layer 9B having the same material as that of the firstelectrode layer 7. However, it is also possible to form the lower layer9A in a sufficiently large thickness, and to omit the upper layer 9B.

In the layer structure shown in FIG. 1, the lower layer 9A serves toprevent unnecessary electron injection from the upper layer 9B into theoptical function layer 5. By using different materials for the twoconductors that are in contact with the optical function layer 5, it ispossible to cause a reversible state change.

A reflective display device 10 as shown in FIG. 2 is one applicationexample of the electric-field-sensitive element 1. The display device 10includes a substrate 11 having a light surface color, band-shaped firstelectrodes 17 that are fixed to the substrate 11 and are arrangedparallel to each other, an optical function layer 15, and band-shapedsecond electrodes 19 that are fixed to the optical function layer 15 andare arranged parallel to each other. The first electrodes 17 and thesecond electrodes 19 intersect to form an electrode matrix. Theelectric-field-sensitive element 1 corresponds to each of theintersecting points of the electrode matrix. That is, part of the firstelectrodes 17, part of the optical function layer 15, and part of thesecond electrodes 19 correspond to the first electrode layer 7, theoptical function layer 5, and the second electrode layer 9,respectively. In FIG. 1, the position of a singleelectric-field-sensitive element 1 is indicated by a quadrangle formedby a dashed-dotted line.

With the display device 10, a matrix display can be provided bycontrolling the amount of external light reflected at the substrate 11on an element-by-element basis. For a configuration in which the lightto be controlled passes through the electric-field-sensitive element 1in the direction in which the layers are laminated as in thisapplication example, it is necessary to provide a translucent conductivelayer made of, for example, indium tin oxide (hereinafter, referred toas “ITO”) as the first and second electrode layers 7 and 9 of theelectric-field-sensitive element 1. In the case where the firstelectrode layer 7 is ITO, it is preferable to use a transparentsemiconductor as the material of the lower layer of the second electrodelayer 9.

A method for producing the display device 10 and theelectric-field-sensitive element included therein includes Steps 1 to 4below.

In Step 1, the first electrodes 17 are arranged on the substrate 11serving both as a support and a reflective member.

In Step 2, the first electrodes 17 fixed to the substrate 11 are coatedwith a translucent layer made up of a metal oxide and an insulatingmaterial covering the metal oxide. The metal oxide is a compoundselected from the group consisting of tin dioxide, titanium dioxide andzinc oxide.

In Step 3, the translucent layer is irradiated with ultraviolet light,and, thereby, the translucent layer is altered to form an opticalfunction layer 15 that exhibits chromism. The alteration is consideredto occur due to the formation of energy levels in the metal oxide as aresult of ultraviolet excitation as described below.

In Step 4, the second electrodes 19 are arranged on the optical functionlayer 15.

In the following, a specific example of the electric-field-sensitiveelement 1 will be described.

Example 1

In Example 1, an optical function layer 5 is formed from tin dioxide(SnO₂), which is a metal oxide, and silicone oil, which is an insulator.The optical function layer 5 has a thickness of 1 μm. The firstelectrode layer 7 is ITO having a thickness of 0.4 μm. The lower layer9A of the second electrode layer 9 is nickel oxide (NiO) having athickness of 0.1 μm, and the upper layer 9B is ITO having a thickness of0.4 μm.

After the first electrode layer 7 was formed on a sheet of white glassas a support having a thickness of 1 mm by sputtering, the opticalfunction layer 5 was formed by the following procedure. A mixed solutionof 0.75 g of tin caproate, 1.28 g of xylene and 0.1 g of silicone oil(TSF433 manufactured by Toshiba Silicone) was prepared. Theabove-mentioned mixed solution was applied by a spin-on process (1200rpm, 10 sec) onto the sheet of white glass to which the first electrodelayer 7 was fixed, and the whole was exposed to an ambient temperatureof 50° C. for 10 minutes to dry, and then fired. The firing temperaturewas 320° C., and the firing time was 10 minutes. Then, the fired layerwas irradiated with ultraviolet light using a low-pressure mercury lamp.The irradiation was carried out under the conditions of 200 mW/cm² for60 mins.

After the optical function layer 5 was formed, the lower layer 9A andthe upper layer 9B were laminated sequentially by sputtering, completingthe production of the electric-field-sensitive element 1.

In order to confirm the optical functionality of theelectric-field-sensitive element 1, voltage pulse signals were appliedto the electric-field-sensitive element 1. At that time, the firstelectrode layer 7 was connected to the potential output terminal of apulse generator, and the second electrode layer 9 (strictly speaking,the upper layer 9B) was connected to the ground terminal. As shown inthe upper half of FIG. 3(A), a positive pulse having an amplitude of +10V and a pulse width of 20 ms, and a negative pulse having an amplitudeof −20 V and a pulse width of 20 ms were repeatedly applied at aninterval of approximately 500 ms. Concurrently therewith, thetransmittance of the electric-field-sensitive element 1 to visible lightwas measured using a measuring instrument having a light-emitting diode(LED) as a light source.

As shown in the lower half of FIG. 3(A), the transmittance valuecyclically changed in response to the repeatedly applied pulses. A statechange in which the transmittance value decreased (this is referred toas “coloring”) occurred in response to the negative pulse, and a statechange in which the transmittance value increased (this is referred toas “decoloring”) occurred in response to the positive pulse. During theinterval period of the pulse application, the state at the end of theimmediately preceding change was maintained. The transmittance at theend of coloring was 80%, and the transmittance at the end of decoloringwas 86%. From FIG. 3(A), it can be seen that theelectric-field-sensitive element 1 according to Example 1 exhibitschromism.

FIG. 3(B) is a waveform chart in which the scale of the time axis ofFIG. 3(A) is magnified, showing the responsiveness to the positivepulse. The response time during decoloring was 5 ms.

FIG. 3(C) is also a waveform chart in which the scale of the time axisof FIG. 3(A) is magnified, showing the responsiveness to the negativepulse. The response time during coloring was 8 ms.

Example 2

In Example 2, the optical function layer 5 is formed from titaniumdioxide (TiO₂), which is a metal oxide, and silicone oil, which is aninsulator. The optical function layer 5 has a thickness of 1 μm. Thematerials, thicknesses and the formation methods of the first electrodelayer 7 and the second electrode layer 9 are the same as those inExample 1 described above.

The optical function layer 5 was formed by the following procedure. Amixed solution of 0.72 g of titanium caproate, 1.14 g of xylene, 0.14 gof butyl cellosolve and 0.25 g of silicone oil (TSF433 manufactured byToshiba Silicone) was prepared. The above-mentioned mixed solution wasapplied by a spin-on process (600 rpm, sec) onto a sheet of white glassto which the first electrode layer 7 was fixed, and the whole wasexposed to an ambient temperature of 50° C. for 10 minutes to dry, andthen fired. The firing temperature was 320° C., and the firing time was10 minutes. Then, the fired layer was irradiated with ultraviolet lightusing a low-pressure mercury lamp. The irradiation was carried out underthe conditions of 200 mW/cm² for 60 mins, as in Example 1.

The optical functionality of the electric-field-sensitive element 1 wasconfirmed in the same manner as in Example 1. That is, as shown in theupper half of FIG. 4(A), a positive pulse having an amplitude of +10 Vand a pulse width of 20 ms, and a negative pulse having an amplitude of−20 V and a pulse width of 20 ms were repeatedly applied at an intervalof approximately 500 ms. Concurrently therewith, the transmittance ofthe electric-field-sensitive element 1 to visible light was measuredusing a measuring instrument having an LED as a light source.

As shown in the lower half of FIG. 4(A), the transmittance valuecyclically changed in response to the repeatedly applied pulses. A statechange in which the transmittance value decreased (coloring) occurred inresponse to the negative pulse, and a state change in which thetransmittance value increased (decoloring) occurred in response to thepositive pulse. During the interval period of the pulse application, thestate at the end of the immediately preceding change was maintained. Thetransmittance at the end of coloring was 79%, and the transmittance atthe end of decoloring was 92%. From FIG. 4(A), it can be seen that theelectric-field-sensitive element 1 according to Example 2 exhibitschromism.

FIG. 4(B) is a waveform chart in which the scale of the time axis ofFIG. 4(A) is magnified, showing the responsiveness to the positivepulse. The response time during decoloring was 17 ms.

FIG. 4(C) is also a waveform chart in which the scale of the time axisof FIG. 4(A) is magnified, showing the responsiveness to the negativepulse. The response time during coloring was 18 ms.

Example 3

A mixed solution of 2 g of tin caproate, 3 g of xylene and 0.5 g ofsilicone oil (TSF433 manufactured by Toshiba silicone) was prepared, andthe mixed solution was subjected to application, drying, firing, andultraviolet irradiation as in Example 1, thereby forming the opticalfunction layer 5.

The second electrode layer 9 was grounded, and a negative pulse havingan amplitude of −20 V and a pulse width of 10 ms was applied to thefirst electrode layer 7. In response to the pulse application, thetransmittance value of the electric-field-sensitive element 1 changedfrom 85% to 56%. Thereafter, during the period in which the appliedvoltage was 0, the transmittance value was maintained at 56%.

Example 4

The same mixed solution as that of Example 3 was prepared. Afterapplication, the solution was more rapidly dried than in Example 3.Except for this, the same procedure as in Example 3 was followed.

By drying the applied mixed solution rapidly, gaps were left as a resultof the evaporation of the solvent, and the fired layer thus formed aparticle aggregate. The porous optical function layer 5 providedimproved contrast. The transmittance value of theelectric-field-sensitive element 1 changed from 85% to 24% in responseto the same pulse application as in Example 3.

The chromism confirmed in the above examples seems to be based on theoperation principles shown in FIG. 5. Although tin dioxide is given asan example, the following description also applies to titanium dioxideand zinc oxide.

As shown in FIG. 5(A), when tin dioxide (amorphous), which is a metaloxide, on the ITO serving as one electrode is irradiated withultraviolet light, an electron in the valence band of the tin dioxide isexcited to the conduction band. In the vicinity of the interface withthe ITO, this electron passes through the insulator with a certainprobability and is temporarily captured by the ITO, resulting in achange in the inter-atomic distance at the site of the valence band fromwhich the electron has been extracted. Although the captured electrongoes back to the valence band of the tin dioxide again, its level hasmoved into the band gap at this time, as shown in FIG. 5(B). Such aphenomenon repeatedly occurs, and many levels are created within theband gap during ultraviolet irradiation as shown in FIG. 5(C). However,electrons that should be captured at these levels are excited byultraviolet light, and move to the ITO. The resulting levels within theband gap that contain no electrons remain even after completion of theultraviolet irradiation. The energy of the light (wavelength) absorbedby metal oxides is dependent on the levels within the band gap. In thecase of tin dioxide, the transmittance value is large when there are fewelectrons within the band gap (transparent state).

The role of the insulator is to form a barrier between the ITO and thetin dioxide, thereby allowing passage of an excited electron. By beingsubjected to ultraviolet irradiation in a state in which the insulatoris disposed between the ITO and the tin dioxide, the tin dioxideundergoes a structural change.

When an electric field is applied to the tin dioxide in a transparentstate in which it has levels within the band gap in a biased manner asshown in FIG. 5(D), an electron from the ITO passes beyond the barrierformed by the insulator and moves to the tin dioxide. When the electronthat has moved is captured at a level within the band gap of the tindioxide, the transmittance value of the tin dioxide decreases. That is,the state changes from the transparent state to a state in which a darkcolor is exhibited. Even after removing the electric field, the darkcolored state is maintained by the electric charge held by the barrier.

When an electric field with the reverse polarity as the above-mentionedfield is applied as shown in FIG. 5(E), the electron that has beencaptured in the band gap turns into a free electron in the conductionband with a certain probability, under external light having an amountof light approximately at the level of interior illumination provided,for example, by a fluorescent light source. This free electron moves tothe ITO. This eventually causes a state in which there is no electron ina level of the band gap. Accordingly, the state of the tin oxide isbrought back from the dark colored state to the transparent state.

According to the foregoing examples, the transmittance value is large ina state in which decoloring has occurred, and it is therefore possibleto realize a reflective display device with high contrast and a brightbackground. The main component of the electric-field-sensitive element 1is solid and, therefore, damage resulting from a mechanical impact tendsnot to occur as much as compared with a configuration composed entirelyof a liquid or containing a large amount of liquid. Since the structureis simple, the present invention advantageously reduces costs.

In the production method according to the foregoing examples, theinsulator is limited to a heat-resistant material that can withstandfiring; however, in the case of using a method in which silicone oil isremoved by washing after firing and a resin is newly packed, it ispossible to use a resin such as an acrylic resin, a polycarbonate resinand an epoxy resin.

An electric-field-sensitive element of the present invention that can beimplemented by the foregoing examples and modifications thereof has thefollowing applications.

Since the amount of change in transmittance is proportional to thevoltage applied, it is possible to realize a gray-scale representationthrough multi-valued control of the applied voltage. It is also possibleto realize a full-color representation as that achieved with liquidcrystals, by using a backlight and a filter.

It is also possible to form an optical function layer 5 having astructure that has been partially changed by ultraviolet irradiation inan arbitrary pattern, and to display an arbitrary shape depending on thecombination of the irradiation pattern and the pattern of the electrodelayer.

As a modification of the display device 10, a substrate obtained byfixing a reflective film to a base material having rigidity orflexibility through lamination or painting can be used as the support ofthe electric-field-sensitive element 1.

The configuration, material properties, method pertaining to theproduction thereof, materials thereof, and so on of theelectric-field-sensitive element 1 and the display device 10 are notlimited to the illustrated examples, and may be changed as necessarywithin the scope in accordance with the gist of the present invention.

INDUSTRIAL APPLICABILITY

The present invention is useful in power-saving displays that consumepower substantially only when the displayed content is updated. Theinvention is also applicable to other displays and various opticalfunction devices including an optical shutter.

1. An electric-field-sensitive element comprising: an optical functionlayer that includes a metal oxide selected from the group consisting oftin dioxide, titanium dioxide and zinc oxide, and an insulating materialcovering the metal oxide, the optical function layer having a visiblelight transmittance value that changes through application of anelectric field; wherein during formation of the electric-field-sensitiveelement, the optical function layer is irradiated with ultraviolet lightso that the optical function layer has levels within a band gap thatcontain no electrons after the irradiation with ultraviolet light; andthe electric-field-sensitive element further comprises a first electrodelayer and a second electrode layer that sandwich the optical functionlayer therebetween.
 2. The electric-field-sensitive element according toclaim 1, wherein the insulating material covering the metal oxide isformed of a particle aggregate.
 3. The electric-field-sensitive elementaccording to claim 1, wherein chromism is exhibited.
 4. Theelectric-field-sensitive element according to claim 3, wherein the firstelectrode layer has a material different from that of the secondelectrode layer.
 5. The electric-field-sensitive element according toclaim 4, wherein the first electrode layer is made of a transparentconductive material that is different from the metal oxide, and thesecond electrode layer is made of a p-type semiconductor at least in aportion thereof in contact with the optical function layer.
 6. Theelectric-field-sensitive element according to claim 5, wherein the firstelectrode layer is made of indium tin oxide, the metal oxide is titaniumdioxide, and the second electrode layer is made of nickel oxide in theportion thereof in contact with the optical function layer.
 7. Theelectric-field-sensitive element according to claim 5, wherein the firstelectrode layer is made of indium tin oxide, the metal oxide is tindioxide, and the second electrode layer is made of nickel oxide in theportion thereof in contact with the optical function layer.
 8. A displaydevice comprising: a support having a light surface color; a firsttranslucent electrode layer fixed to the support; an optical functionlayer covering the first translucent electrode layer; and a secondtranslucent electrode layer laminated on the optical function layer,wherein the optical function layer includes a metal oxide selected fromthe group consisting of tin dioxide, titanium dioxide and zinc oxide,and an insulating material covering the metal oxide, and has a visiblelight transmittance value that changes through application of anelectric field, and wherein, during formation of the display device, theoptical function layer is irradiated with ultraviolet light so that theoptical function layer has levels within a band pap that contain noelectrons after the irradiation with ultraviolet light.
 9. A method forproducing an electric-field-sensitive element comprising an opticalfunction layer that includes a metal oxide selected from the groupconsisting of tin dioxide, titanium dioxide and zinc oxide, and aninsulating material covering the metal oxide, the optical function layerhaving a visible light transmittance value that changes throughapplication of an electric field, and a first electrode layer and asecond electrode layer that sandwich the optical function layertherebetween, the method comprising: coating the first electrode layerfixed to a support with a translucent layer made of the metal oxide andan insulating material covering said metal oxide; irradiating thetranslucent layer with ultraviolet light, thereby altering thetranslucent layer to form the optical function layer; and fixing thesecond electrode layer to the optical function layer.